서지주요정보
DC magnetron sputttering 방법으로 제조한 Fe-N 박막의 구조와 자기적 성질 = Structure and magnetic properties of Fe-N thin films deposited by DC magnetron sputtering
서명 / 저자 DC magnetron sputttering 방법으로 제조한 Fe-N 박막의 구조와 자기적 성질 = Structure and magnetic properties of Fe-N thin films deposited by DC magnetron sputtering / 이종화.
저자명 이종화 ; Lee, Jong-Hwa
발행사항 [대전 : 한국과학기술원, 1993].
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소장정보

등록번호

8003827

소장위치/청구기호

학술문화관(문화관) 보존서고

MEM 93017

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초록정보

The iron nitride(Fe-N) thin films were deposited using a DC magnetron sputtering system. The dependence of the crystallographic characteristics and magnetic properties (Ms, Hc) on the deposition power and nitrogen input ratio $F_{N_2}/F_{total}$ was investigated. The effects of lattice distortion on the microstructure and the coercivity were discussed. The film deposited at low nitrogen input ratios had a distorted α-Fe structure and as nitrogen input ratio increased, hcp $Fe_{2-3}N$ and orth $Fe_2N$ phases were formed. At low nitrogen inlput ratios the films showed a saturation magnetization, 4πMs, of about 20kG which is close to that of pure bulk iron. The saturation magnetization was markedly decreased with formations of $Fe_{2-3}N$ and $Fe_2N$ phases. The coercivity was also strongly dependent on nitrogen input ratio. These results were consistent throughout all deposition power conditions. The dependence of coercivity on nitrogen gas input ratio was closely related with the lattice distortion which results from nitrogen solid solution effects. The film which has low coercivity had a fine grained structure with a smooth surface. The decrease of coercivity could be attributed to disordered columnar growth which is caused by lattice distortion. A small coercivity of 0.94Oe was obtained from the films deposited at 30W, $F_{N_2}/F_{total}$=6%.

서지기타정보

서지기타정보
청구기호 {MEM 93017
형태사항 iii, 56 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Jong-Hwa Lee
지도교수의 한글표기 : 이원종
지도교수의 영문표기 : Won-Jong Lee
학위논문 학위논문(석사) - 한국과학기술원 : 전자재료공학과,
서지주기 참고문헌 : p. 51-53
주제 Microstructure.
Metals --Magnetic properties.
Sputtering (Physics)
Thin films.
미세 구조. --과학기술용어시소러스
자기적 성질. --과학기술용어시소러스
자성 박막. --과학기술용어시소러스
스퍼터링. --과학기술용어시소러스
Iron nitride.
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