서지주요정보
제조공정과 사용조건을 고려한 X-선 마스크의 변형해석 = Analysis of structural distortions of an X-ray mask considering fabrication processes and writing conditions
서명 / 저자 제조공정과 사용조건을 고려한 X-선 마스크의 변형해석 = Analysis of structural distortions of an X-ray mask considering fabrication processes and writing conditions / 김일용.
저자명 김일용 ; Kim, Il-Yong
발행사항 [대전 : 한국과학기술원, 1997].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8007599

소장위치/청구기호

학술문화관(문화관) 보존서고

MME 97019

휴대폰 전송

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이용가능

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반납예정일

초록정보

The distortion of the membrane in X-ray lithography is increasingly important as the integration density gets higher. It comes from several different sources such as fabrication processes, fixturing, X-ray exposure and so on. In this thesis, an analysis procedure of the distortion by FEM is established and numerically illustrated. Gravity, heat due to X-ray exposure and radiation damage make patterns to be distorted. The higher Young's modulus is, the smaller the deformation of the membrane is. Deformation induced by the difference of thermal expansion coefficient between the membrane and its supporting Pyrex ring can be reduced by adjusting the temperature of anodic bonding. A method of analyzing the transient behavior due to a scanning X-ray is also suggested and sample calculations made. The pattern distortions and the amount of the resulting blur induced during a writing period are calculated and individual contributions of each load are discussed. Although tuning of the models and their verification is not studied extensively, the preliminary results have indicated general tendencies.

서지기타정보

서지기타정보
청구기호 {MME 97019
형태사항 ix, 70 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Il-Yong Kim
지도교수의 한글표기 : 곽병만
지도교수의 영문표기 : Byung-Man Kwak
학위논문 학위논문(석사) - 한국과학기술원 : 기계공학과,
서지주기 참고문헌 : p. 30-32
주제 X-선 마스크
변형해석
X-ray mask
Membrane distortion
X-ray lithography
IPD
OPD
Pattern distortion
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