서지주요정보
증착 조건이 TiC-TiN double layer 화학 증착에 미치는 영향에 관한 연구 = Effect of deposition conditionson TiC-TiN double layer coating by chemical vapor deposition
서명 / 저자 증착 조건이 TiC-TiN double layer 화학 증착에 미치는 영향에 관한 연구 = Effect of deposition conditionson TiC-TiN double layer coating by chemical vapor deposition / 김무성.
저자명 김무성 ; Kim, Moo-Sung
발행사항 [서울 : 한국과학기술원, 1982].
Online Access 원문보기 원문인쇄

소장정보

등록번호

4101636

소장위치/청구기호

학술문화관(문화관) 보존서고

MMS 8205

SMS전송

도서상태

이용가능

대출가능

반납예정일

초록정보

Titanium nitride (TiN) was deposited onto TiC-coated WC-Co substrates by chemical vapor deposition (CVD) using $TiCl_4$, $H_2$, $N_2$ gas mixture. In this work, the effects of deposition temperature, total flow rate of reactant gases. deposition time, $TiCl_4$ partial pressure and $H_2$ partial pressure on the deposition rate, final structure and the preferred orientation of TiN deposit were investigated. The controlling mechanism of TiN deposition reaction depending on deposition temperature and total flow rate of reactant gases was also investigated. The deposition rate of TiW is increased with an increase in $TiCl_4$ partial pressure. The deposition rate shows a maximum at the $H_2$ partial pressure of 0.70 atm. Equiaxed grain structure is obtained under all experimental conditions, and (220) preferred orientation is obtained except some conditions. Particle size of TiN deposit is reduced with an increase in $TiCl_4$ partial pressure. The deposition reaction of TiN is controlled by the mass transport mechanism when deposition temperature is higher than 1000℃ and total flow rate of reactant gases is less than 700 cc/min. On the other hand, the reaction is controlled by the surface reaction mechanism when deposition temperature is lower than 1000℃ and total flow rate is larger than 700 cc/min.

서지기타정보

서지기타정보
청구기호 {MMS 8205
형태사항 [iv], 68 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Moo-Sung Kim
지도교수의 한글표기 : 남수우
공동교수의 한글표기 : 천성순
지도교수의 영문표기 : Soo-Woo Nam
공동교수의 영문표기 : Sung-Sun Chun
학위논문 학위논문(석사) - 한국과학기술원 : 재료공학과,
서지주기 참고문헌 : p. 63-68
주제 Chemical vapor deposition.
Titanium nitride.
화학 증착. --과학기술용어시소러스
부분 압력. --과학기술용어시소러스
우선 방위. --과학기술용어시소러스
Preferred orientation.
Surface reaction.
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