A color filter array for flat panel LCD's using the $TiO_2-SiO_3$ multilayer optical filter is designed and fabricated.
The multilayer is analyzed through the scattering matrix method. With this formalism a multilayer filter having desired characteristics can be designed automatically by designing program.
The $TiO_2$ films are deposited through reactive r.f. sputtering of Ti with oxigen gas and detailed data for deposition rates and refractive indices are obtained from the measurement of transmittance with varian spectro photometer CARY modeld 17.
One peculiar process step is the modified Lift-off technique which remove the dielectric layer on the AZ 1350J photoresist through ultrasonic agitation in the first place and then remove the photoresist in $H_2SO_4$ solution.
