A 3∼5μm photovoltaic infrared detector which has $n^+$/p structure has been fabricated.
The substrate of the photovoltaic(PV) device is $Hg_{1-x}Cd_x$Te with composition of x=0.288 and p concentration of $Na=1.9\times10^{15}/cm^3$. $N^+$-type region is formed by boron ion implantation with an energy of 100keV, dose of $1\times10^{14}cm^{-2}$. The diode has a circular shape with diameter of 2.71mm.
Ideality factor of the P-V device is 2.0 and its $R_oA$ is $11,000\Omega-cm^2$. The normalized detectivity of $4.7\times10^9cmHz^{1/2}$/W has been measured.
The goal of present investigation is to acheive $R_oA$ 200Ω-㎠, and dectectivity greater than $1.0\times10^{11}cmHz^{1/2}/W$. In order to meet this goal, it is believed that $Hg_{1-x}Cd_xTe$ with x=0.3 and p concentration of about $2\times10^{16}/cm^3$ has to be used.