서지주요정보
광리소그라피 용 비정질 $AS_2S_3$ 박막, KPR 및 사진유제의 입출력 특성 = Input/output relationships of photographic emalsion, KPR and $AS_2S_3$ film
서명 / 저자 광리소그라피 용 비정질 $AS_2S_3$ 박막, KPR 및 사진유제의 입출력 특성 = Input/output relationships of photographic emalsion, KPR and $AS_2S_3$ film / 김대영.
저자명 김대영 ; Kim, Dae-Young
발행사항 [서울 : 한국과학기술원, 1980].
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소장정보

등록번호

4000851

소장위치/청구기호

학술문화관(문화관) 보존서고

MAP 8001

휴대폰 전송

도서상태

이용가능

대출가능

반납예정일

초록정보

In this experiment, the input/output relationships of the optical image recording materials ; photographic emulsions (Kodak Tri-X and AHU microfilm), Kodak photoresist and amorphous $As_2S_3$ thin sold film, are determined, and the photolithography using those materials are carried out on copper plate and glass. The Hurter-Driffield curves, r-values and modulation transfer functions using two-stage model are determined first and then their variations on developing conditions are established. In AHU microfilm the modulation transfer function using two-stage model is found to decrease as the developing time gets longer but in Tri-X experimentally attained value of it is nearly constant. The characteristic curves, corresponding to Hurter-Driffield curve of photographic film, of Kodak photoresist (organic resist) and $As_2S_3$ thin film (inorganic photoresist) are determined. Their linearity feature is less distinct than that of photographic film. Kodak photoresist is used as chemical negative resist for photolithography on copper plate (35 um thick) and glass. In this experiment, the resolution of image on copper and glass plates are found to decrease as the etchdepth gets deeper. In recording relief image on glass by photolithography, 50 lines per mm are resoluved with 1μm etch-depth and 15 lines per mm with 3.3 um etch-depth.

서지기타정보

서지기타정보
청구기호 {MAP 8001
형태사항 [iv], 86 p. : 삽도 ; 26 cm
언어 한국어
일반주기 부록 수록
저자명의 영문표기 : Dae-Young Kim
지도교수의 한글표기 : 이상수
지도교수의 영문표기 : Sang-Soo Lee
학위논문 학위논문(석사) - 한국과학기술원 : 물리학과,
서지주기 참고문헌 : p. 81-83
주제 Arsenic sulphide.
Thin films.
Photolithography.
Photoresists.
비정질. --과학기술용어시소러스
황화비소. --과학기술용어시소러스
박막. --과학기술용어시소러스
리소그래피. --과학기술용어시소러스
포토레지스트. --과학기술용어시소러스
Amorphous substances.
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