In this experiment, the input/output relationships of the optical image recording materials ; photographic emulsions (Kodak Tri-X and AHU microfilm), Kodak photoresist and amorphous $As_2S_3$ thin sold film, are determined, and the photolithography using those materials are carried out on copper plate and glass.
The Hurter-Driffield curves, r-values and modulation transfer functions using two-stage model are determined first and then their variations on developing conditions are established. In AHU microfilm the modulation transfer function using two-stage model is found to decrease as the developing time gets longer but in Tri-X experimentally attained value of it is nearly constant.
The characteristic curves, corresponding to Hurter-Driffield curve of photographic film, of Kodak photoresist (organic resist) and $As_2S_3$ thin film (inorganic photoresist) are determined. Their linearity feature is less distinct than that of photographic film.
Kodak photoresist is used as chemical negative resist for photolithography on copper plate (35 um thick) and glass. In this experiment, the resolution of image on copper and glass plates are found to decrease as the etchdepth gets deeper. In recording relief image on glass by photolithography, 50 lines per mm are resoluved with 1μm etch-depth and 15 lines per mm with 3.3 um etch-depth.
