서지주요정보
UV submicron lithography 를 위한 4반사광학계의 설계 및 수차해석 = Design and analysis of the four mirror optical system for UV submicron lithography
서명 / 저자 UV submicron lithography 를 위한 4반사광학계의 설계 및 수차해석 = Design and analysis of the four mirror optical system for UV submicron lithography / 박성찬.
저자명 박성찬 ; Park, Sung-Chan
발행사항 [대전 : 한국과학기술원, 1991].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8001609

소장위치/청구기호

학술문화관(문화관) 보존서고

DAP 9105

SMS전송

도서상태

이용가능

대출가능

반납예정일

초록정보

A design of a four mirror optical system with reduction magnification 5X for UV(KrF excimer laser) submicron lithography is presented. We have obtained initially the analytic solutions of the four spherical mirror system free from the four Seidel aberrations that are spherical aberration, coma, astigmatism and field curvature. However, the systems obtained after numerous corrections have still sizable amount of residual aberrations and the half field angle of only 1 degree is realizable, which limit the numerical aperture and image field diameter to 0.15 and 3.5mm, respectively. To overcome these shortcommings, at first, the conic surfaces are introduced to the primary, tertiary and quaternary mirrors, and then the optimization is carried out to the system using a simple damped least squares method. These procedures give improved performances, in other words, higher order aberrations are significantly reduced and vignetting effect compared with that of the four spherical mirror system is far less. The numerical aperture is 0.25 and image field diameter increases up to 7mm. But the overall performances are still limited mainly by residual distortion and small field, so the system at this stage may be useful in a scanning lithography. Hence, another method which is a aspherization of all mirrors with higher order(up to tenth) asphericities is proposed. As a result, we obtain a reflection system useful in a submicrion lithographic applications. The image field diameter of the resulting system is 10mm and numerical aperture is 0.25, which gives practical resolution of 0.8$\mu$m.

서지기타정보

서지기타정보
청구기호 {DAP 9105
형태사항 iii, 86 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Sung-Chan Park
지도교수의 한글표기 : 이상수
지도교수의 영문표기 : Sang-Soo Lee
학위논문 학위논문(박사) - 한국과학기술원 : 물리학과,
서지주기 참고문헌 : p. 79-86
주제 Lithography
Aberration
반사계 --과학기술용어시소러스
리소그래피 --과학기술용어시소러스
수차 (광학) --과학기술용어시소러스
Mirrors
QR CODE qr code