서지주요정보
Nd:YAG 펄스 레이저 충격파를 이용한 PSL 초미세 입자 세정 = Cleaning of PSL ultrafine particles with shockwave generated from Nd:YAG pulsed laser
서명 / 저자 Nd:YAG 펄스 레이저 충격파를 이용한 PSL 초미세 입자 세정 = Cleaning of PSL ultrafine particles with shockwave generated from Nd:YAG pulsed laser / 지명연.
저자명 지명연 ; Ji, Myoung-Yeon
발행사항 [대전 : 한국과학기술원, 2005].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8016033

소장위치/청구기호

학술문화관(문화관) 보존서고

MME 05049

SMS전송

도서상태

이용가능

대출가능

반납예정일

초록정보

Removing nanoparticles from substrate is a challenging task with numerous critical applications. Laser shockwave cleaning technique, which is dry and non-contact, takes advantages of shockwave fronts initiated by plasma formation under a focused laser beam. In the reported experiments, a Q-switched Nd:YAG pulsed laser with 1064 nm wavelength is employed as a shockwave generation source. Images before and after cleaning of silicon wafer are measured by optical microscope. Experimental results indicate that PSL particles with 1 μm, 500nm, 200nm diameters on silicon wafers can be removed without substrate damage. The influence of mixed different size particle, substrate roughness and double shockwave on the cleaning efficiency is reported. The laser cleaning experiments of wafers, on which different size particles exist together, show that it is possible to remove bigger particles without the influence on smaller particles. The laser cleaning efficiency from rough substrate is lower than that from the smooth substrate at same laser incident energy. But the laser cleaning efficiency from rougher substrate is also promoted to the same efficiency in case of smooth substrate as laser energy increases. It is founded that cleaning by double shockwave provides an advantage in speed for cleaning large areas.

서지기타정보

서지기타정보
청구기호 {MME 05049
형태사항 xiv, 74 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Myoung-Yeon Ji
지도교수의 한글표기 : 김상수
지도교수의 영문표기 : Sang-Soo Kim
학위논문 학위논문(석사) - 한국과학기술원 : 기계공학전공,
서지주기 참고문헌 : p. 36-38
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