For generation of the low electron temperature plasma, new type of plasma generation is introduced. Electron beam makes excitation of neutral gas(Ar), and UV photon assists ionization of excited gas(Ar*). Beam of acceleration voltage is 20V, of current is 350μA. The wavelength of UV source is in the range of 250nm and 680nm. First, e-beam plasma parameters(Te, Ne) are measured by planar probe. Then after UV source irradiates plasma, changing plasma parameters are measured. Electron density and temperature increases, and low velocity electrons increase also.
