서지주요정보
그리드를 장착한 DC 마그네트론 스퍼터링 플라즈마의 특성 연구 = Plasma characteristics of DC magnetron sputtering source with grids
서명 / 저자 그리드를 장착한 DC 마그네트론 스퍼터링 플라즈마의 특성 연구 = Plasma characteristics of DC magnetron sputtering source with grids / 인정환.
저자명 인정환 ; In, Jeong-Hwan
발행사항 [대전 : 한국과학기술원 2004].
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소장정보

등록번호

8014800

소장위치/청구기호

학술문화관(문화관) 보존서고

MPH 04002

SMS전송

도서상태

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초록정보

The DC magnetron sputtering source to deposit a metal thin film has been improved for many years. The representative advanced magnetron is an IPVD using an ICP coil. Recently the new type magnetron sputtering source which has two grids between target and substrate is developed. the deposited film using new type magnetron is much more smooth than that without grids. So in this study, the plasma characteristics of the new type magnetron is examined. and also the plasma characteristics of conventional DC magnetron sputtering and the magnetron using 1 grid is studied. In result, It is revealed that the grid inserted between the target and the substrate makes plasma potential difference. The potential difference characterized the plasma characteristics of the region between the target and the grid and that between the substrate and the grid. Because of the plasma density variation caused by plasma potential difference, it seems that the Penning ionization process of target material between the substrate and the grid in new type magnetron is enhanced and it is thought that target ion density/Ar ion density is increased and the ion ratio makes the film smooth.

서지기타정보

서지기타정보
청구기호 {MPH 04002
형태사항 iv, 35 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Jeong-Hwan In
지도교수의 한글표기 : 장홍영
지도교수의 영문표기 : Hong-Young Chang
학위논문 학위논문(석사) - 한국과학기술원 : 물리학과,
서지주기 참고문헌 : p. 34-35
주제 DC 마그네트론 스퍼터링 소스
플라즈마
단일 랑뮤어 탐침
진단
DC magnetron sputtering source
plasma
single Langmuir probe
diagnostics
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