서지주요정보
마그네트론 스퍼터링에서의 타겟 식각 및 박막 증착에 관한 연구 = Study on the target erosion and film deposition in magnetron sputtering system
서명 / 저자 마그네트론 스퍼터링에서의 타겟 식각 및 박막 증착에 관한 연구 = Study on the target erosion and film deposition in magnetron sputtering system / 최선희.
저자명 최선희 ; Choi, Sun-Hee
발행사항 [대전 : 한국과학기술원, 2003].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8014026

소장위치/청구기호

학술문화관(문화관) 보존서고

MMS 03040

SMS전송

도서상태

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대출가능

반납예정일

초록정보

In a semiconductor equipment, high accumulation process and large area process have become important for their high efficiency and large capacity. Sputter gun development of more than 12“ was needed in order to deposit uniformly on more than 8” Si wafer. As a diameter of the sputter gun increased, uniform erosion shape of target and film deposition uniformity on wafer were important. In this thesis, we studied the relationship of effective potential and target erosion profiles. We simulated the film deposition profiles on wafer based on the flux simulation. Also we investigated the effect of parameters such as pressure, power, Target-Substrate distance and sputtering time on film deposition through experiments. Sputtering magnet assembly includes a plate-shaped pole piece made from a magnetically permeable material and a central magnet positioned substantially at the center of the pole piece and oriented so that its north-south magnetic orientation was substantially perpendicular to the plate shaped pole piece. A plurality of outer magnets were positioned around the centeral magnet, each of which has its north-south magnetic orientation also perpendicular to the pole piece, but opposite of the orientation of the central magnet. Target erosion profiles were measured by the surface profiler, and the film deposition thickness was measured by α-step. Target erosion profiles were predicted by effective potential in case that north-south magnetic orientation of magnet was substantially perpendicular to the plate shaped pole piece. The Stronger magnetic field strength, the more fast sputtering rate. Target erosion profiles were independent of the impressed power. Experimental deposition profiles agreed with results of the flux simulation at low pressure. Difference between experimental data and simularion result increased with increasing pressure, target-substrate distance and discharge power. In this thesis, we predicted target erosion profiles easily by effective potential and the film deposition profiles through the flux simulation.

서지기타정보

서지기타정보
청구기호 {MMS 03040
형태사항 viii, 82 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Sun-Hee Choi
지도교수의 한글표기 : 이원종
지도교수의 영문표기 : Won-Jong Lee
학위논문 학위논문(석사) - 한국과학기술원 : 재료공학과,
서지주기 참고문헌 : p. 80-82
주제 스퍼터링
Sputtering
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