서지주요정보
VCM을 이용한 wafer용 xyθ 미세구동기의 설계와 제어 = The design and control of xyθ fine stage using VCM for wafer stage
서명 / 저자 VCM을 이용한 wafer용 xyθ 미세구동기의 설계와 제어 = The design and control of xyθ fine stage using VCM for wafer stage / 김동민.
저자명 김동민 ; Kim, Dong-Min
발행사항 [대전 : 한국과학기술원, 2002].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8012758

소장위치/청구기호

학술문화관(문화관) 보존서고

MME 02015

SMS전송

도서상태

이용가능

대출가능

반납예정일

초록정보

The quality of a precision product, in general, relies on the accuracy and precision of its manufacturing and inspection process. In many cases, the level of precision in the manufacturing and inspection system is also dependent on the positioning capability of tool with respect to the workpiece in the process. Recently the positioning accuracy level employed for some of precision product has reached the level of submicron and long range of motion is required. For example, for 1GDRM Iithoghrphy, 20nm accuracy and 300mm stroke needs. This paper refers to the lithography stage especially fine stage. In this study, for long stroke and high accuracy, the dual servo system is proposed . For the coarse actuator, LDM(Linear DC Motor)is used and for fine one VCM is used. In this study, we propose the new structure of VCM for the fine actuator. It is 3 axis precision positioning stage for an aligner system. Then we performed the optimal design of the stage to obtain the maximum force which is related to the acceleration of the stage to accomplish throughput of product. To control this fine stage, first, system and parameter modelling is performed to correct the modelling error. In this paper, the objects of control are resolution and high speed. To attain it, gain scheduling control method based on the TDC(Time Delay Control) is applied in control step. Reference model gain of TDC is varied according to the real time state in the system control process. By this method high gain control which made the system have high disturbance rejection ability can be performed in the fine error region. And low gain control considering the actuator saturation limit to prevent wind up phenomena is performed in large error region. As a result we could control the actuator to have the resolution below 50nm which is the resolution that wafer needs.

서지기타정보

서지기타정보
청구기호 {MME 02015
형태사항 vii, 76 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Dong-Min Kim
지도교수의 한글표기 : 권대갑
지도교수의 영문표기 : Dae-Gab Gweon
학위논문 학위논문(석사) - 한국과학기술원 : 기계공학전공,
서지주기 참고문헌 수록
주제 VCM
미세구동기
개념설계
최적설계
제어
VCM(Voice Coil Motor)
fine stage
conceptual design
optimal design
control
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