서지주요정보
Titanium isopropoxide와 ammonia를 이용하는 촉매화학기상증착법에 의한 $TiO_2$ 박막 형성에 관한 연구 = A study on the formation of $TiO_2$ thin films using titanium isopropoxide and ammonia by catalytic CVD
서명 / 저자 Titanium isopropoxide와 ammonia를 이용하는 촉매화학기상증착법에 의한 $TiO_2$ 박막 형성에 관한 연구 = A study on the formation of $TiO_2$ thin films using titanium isopropoxide and ammonia by catalytic CVD / 정승훈.
저자명 정승훈 ; Jung, Seung-Hoon
발행사항 [대전 : 한국과학기술원, 2001].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8012545

소장위치/청구기호

학술문화관(문화관) 보존서고

DMS 01022

SMS전송

도서상태

이용가능

대출가능

반납예정일

초록정보

We have studied metalorganic chemical vapor deposition of $TiO_2$ thin films using titanium tetra-isopropoxide (TTIP) with pyridine and ammonia as a catalyst at deposition temperatures from 250 to 365℃. The $TiO_2$ films deposited by thermal decomposition of TTIP have anatase structure and the activation energy of the $TiO_2$ film growth rate is 152 kJ/mol. The pyridine and ammonia catalysts enhance the $TiO_2$ film growth rate because they reduce the activation energy of the film growth rate to 55 kJ/mol when the deposition temperature is below 310℃. The crystal structure of the $TiO_2$ films deposited using TTIP with pyridine catalyst is anatase structure, but the films deposited at the deposition temperature below 300℃ using TTIP with ammonia catalyst at has amorphous structure with fine TiO crystalline and with 11 at.% N impurity in the film. As the deposition temperature increases, the amount of N impurity decreases and the amount of anatase $TiO_2$ crystalline in the film increases. The as-deposited anatase $TiO_2$ films remain the anatase structure after performing a post-deposition anneal in oxygen ambient for 30 min at 750℃. However, the amorphous $TiO_2$ film with N impurity deposited at 270℃ using TTIP and ammonia catalyst transforms to pure rutile $TiO_2$ structure with very smooth surface roughness after performing the post-deposition anneal. A Pt/$TiO_2$/Si capacitor composed by the rutile $TiO_2$ film has a high dielectric constant of 82 and low leakage current, so that useful for capacitor of electrical devices.

서지기타정보

서지기타정보
청구기호 {DMS 01022
형태사항 viii, 104 p. : 삽도; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Seung-Hoon Jung
지도교수의 한글표기 : 강상원
지도교수의 영문표기 : Sang-Won Kang
수록잡지명 : "Formation of TiO2 thin films using NH3 as a catalyst in metalorganic chemical vapor deposition". Japanese journal of appled physics, (accepted), (2001)
학위논문 학위논문(박사) - 한국과학기술원 : 재료공학과,
서지주기 참고문헌 수록
주제 촉매 기상화학증착
산화 티탄
암모니아
피리딘
루타일
Catalytic CVD
TiO2
Ammonia
Pyridine
rutile
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