서지주요정보
자력을 이용한 극청정 내면의 폴리싱에 관한 연구 = Study on polishing of ultra-clean inner surface using magnetic force
서명 / 저자 자력을 이용한 극청정 내면의 폴리싱에 관한 연구 = Study on polishing of ultra-clean inner surface using magnetic force / 허강운.
발행사항 [대전 : 한국과학기술원, 2000].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8010907

소장위치/청구기호

학술문화관(문화관) 보존서고

MME 00082

휴대폰 전송

도서상태

이용가능

대출가능

반납예정일

리뷰정보

초록정보

Recently, the technology for internal polishing is needed to ultra-clean machining method for the purpose of corrosion, pollution prevention of parts in the area of high technology industry such as semiconductor, electronics, telecommunication, optics, aerospace, and motors. The method for previous ultra-clean internal polishing such as the Electro-Chemical Polishing (ECP) and the Magneto-Electrolytic-Abrasive Polishing (MEAP) exists, but there are two problems as follows. First, high cost was required for the production of ultra-clean surface. Second, environment pollution in relation to electrolytic treatment was followed. In this study, internal polishing system using the magnetic force was developed for the production of averaged surface roughness in the range of between 0.02 ㎛ and 0.05 ㎛ or less than this, and magnetic abrasive composed of WC/Co powder was developed. After finding the optimal polishing condition on each, machining properties for newly developed abrasives was analyzed. From the results obtained by experimental design method, the optimal polishing condition was analyzed, and thereafter internal polishing was done.

서지기타정보

서지기타정보
청구기호 {MME 00082
형태사항 vi, 44 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Gang-Woon Heo
지도교수의 한글표기 : 김정두
지도교수의 영문표기 : Jeong-Du Kim
학위논문 학위논문(석사) - 한국과학기술원 : 기계공학전공,
서지주기 참고문헌 : p. 20-21
주제 내면폴리싱
극청정
자기입자
표면조도
Internal polishing
Ultra-clean
Magnetic abrasive
Surface roughness
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