서지주요정보
대면적 Transformer coupled plasma에서 티끌입자의 성장 및 제어 = Growth and control of dust particles in large area transformer coupled plasma
서명 / 저자 대면적 Transformer coupled plasma에서 티끌입자의 성장 및 제어 = Growth and control of dust particles in large area transformer coupled plasma / 배인덕.
저자명 배인덕 ; Bae, In-Deog
발행사항 [대전 : 한국과학기술원, 2000].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8010667

소장위치/청구기호

학술문화관(문화관) 보존서고

MPH 00017

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초록정보

In fabrication of micro-electronic circuits, the decrease of yield caused by contamination of wafers is an important issue. The dust particles contaminating wafers are categorized into two different types. One is the flake type which is originated from chamber wall, and the other is the sphere type of the typical size of 0.1 μm which is generated inside of plasmas. The nanometer-sized particles from chamber wall or wafers grow in plasma through the chemical interaction with plasma ions. Since dust particles are negatively charged, they exprience electrostatic force in the sheath area. When a wafer is located in the plasma, the sheath potential around the wafer is changed into the non-uniform shape. The dust particles are trapped by this non-uniform potential and fall down to the wafer when the plasma is turned off. In this thesis work, the 0.05μm alumina powder is utilized as particle seed and the evaporated acetone is used as working gas. SEM pictures show dust particles grown up to about 1μm size in the acetone plasma. These particles are observed at the edge of glass substrate. Negative voltage is biased to the grid which is placed above the glass substrate. The glass substrate is more contaminated when the bias voltage is -200V compared with the unbiased case. However, when the bias voltage is -100V, the contamination is decreased.

서지기타정보

서지기타정보
청구기호 {MPH 00017
형태사항 [ii], 47 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : In-Deog Bae
지도교수의 한글표기 : 최원호
지도교수의 영문표기 : Won-Ho Choe
학위논문 학위논문(석사) - 한국과학기술원 : 물리학과,
서지주기 참고문헌 : p. 46-47
주제 티끌입자
플라즈마
대면적 TCP
Dusty plasma
Dust partilce
Particulate
TCP
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