In future optical memory systems, it is important to read and write high density information in the medium with high speed. To realize this, we suggest the sub-wavelength aperture VCSEL(vertical-cavity surface-emitting laser) array as an optical head. We manufacture a few hundred nano meter aperture on a metal-coated VCSEL using electron-beam lithography. New electron-beam writing method is proposed when electron-beam writer has no beam blanker. And we try to measure the near-field light from the aperture by NSOM(near-field scanning optical microscope).