서지주요정보
증착률 균일화를 위한 화학증착 반응로에서 운전조건 및 형상 최적화에 관한 연구 = Operating condition and shape optimization of a CVD reactor for uniform film growth
서명 / 저자 증착률 균일화를 위한 화학증착 반응로에서 운전조건 및 형상 최적화에 관한 연구 = Operating condition and shape optimization of a CVD reactor for uniform film growth / 조원국.
발행사항 [대전 : 한국과학기술원, 1999].
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소장정보

등록번호

8009633

소장위치/청구기호

학술문화관(문화관) 보존서고

DME 99028

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리뷰정보

초록정보

Numerical optimization procedure of operating conditions and reactor shapes for a uniform epitaxial layer has been developed for vertical and horizontal reactors. Boundary conditions at the inlet for vertical reactors, and the shape of the horizontal reactor are optimized in the present study. The objective is to minimize the cost function which is defined as the spatial nonuniformity of the growth rate. Followings are incorporated to achieve the aforementioned goal; The cost function is linearized by sequential linear programming to overcome the nonlinear relation between the cost function and the design variables; The design variable for the linearized problem is sought by the random search technique. The sensitivity of the cost function on a design variable is estimated directly from the relation between the growth rate and the reactant concentration distribution. The Navier-Stokes equations that govern the fluid motion, temperature and concentration are solved by a SIMPLE based finite volume method on a nonorthogonal grid. Also adopted is the reduced basis method that gives an approximate optimal solution to save computation time. The optimization method is applied to find an improved inlet boundary condition for the vertical reactor. The optimization is effective for high Reynolds number flows while it becomes less effective for low Reynolds number flows since any characteristic distributions at inlet is nullified by the strong diffusion. Optimized inlet velocity profile is shown to suppress the buoyancy driven recirculation and increase the uniformity successfully. For the horizontal reactor, optimizing the reactor geometry is found to be an effective parameter for uniformity. The uniformity is proportional to the Reynolds number regardless of the reactor shape. The relative improvement in uniformity appears to be more pronounced for the horizontal reactors than for the vertical ones. The recirculating flow has adverse effects on uniformity for horizontal reactors; A properly designed reactor can completely remove the recirculation and grow epitaxial layers with perfect uniformity.

서지기타정보

서지기타정보
청구기호 {DME 99028
형태사항 xv, 156 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Won-Kook Cho
지도교수의 한글표기 : 최도형
지도교수의 영문표기 : Do-Hyung Choi
학위논문 학위논문(박사) - 한국과학기술원 : 기계공학과,
서지주기 참고문헌 : p. 151-156
주제 전산유체역학
화학증착
최적화
균일도
CFD
CVD
Optimization
Uniformity
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