서지주요정보
RPCVD에 의해 증착된 $Si_3N_4/SiO_2/SiON$ 박막들의 MMIC\&OEIC 응용에 관한 연구 = Study for the application of $Si_3N_4/SiO_2/SiON$ films deposited by RPCVD to MMIC\&OEIC
서명 / 저자 RPCVD에 의해 증착된 $Si_3N_4/SiO_2/SiON$ 박막들의 MMIC\&OEIC 응용에 관한 연구 = Study for the application of $Si_3N_4/SiO_2/SiON$ films deposited by RPCVD to MMIC\&OEIC / 이종주.
저자명 이종주 ; Lee, Jong-Joo
발행사항 [대전 : 한국과학기술원, 1997].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8007779

소장위치/청구기호

학술문화관(문화관) 보존서고

MEE 97068

SMS전송

도서상태

이용가능

대출가능

반납예정일

초록정보

Silicon nitride, silicon dioxide, and silicon oxynitride films have been deposited using RPCVD, in which the substrate temperature is low (∼250℃)and the electronic damage is negligible because plasma region is separated from deposition chamber. Nearly Stoichiometric $SiO_2$ and $Si_3N_4$ have been deposited and incorporated bonded hydrogen concentrations were very low. And in silicon nitride and silicon oxynitride, the refractive indices can be vary in wide range by varying the composition ratio of the reactant gases. As an application to MMIC, MIM capacitors, which are bottleneck of yield in MMIC are fabricated using these silicon nitrides and obtained very good characteristics as dielectric materials. And as an application to OEIC, dielectric optical waveguides are fabricated using these films as guiding layers and OPS as an buffer layer. Also, bend-type waveguide, which is adequate for efficient small size OEIC implementation, is proposed and fabricated.

서지기타정보

서지기타정보
청구기호 {MEE 97068
형태사항 iii, 65 p. : 삽도 ; 26 cm
언어 한국어
일반주기 부록 수록
저자명의 영문표기 : Jong-Joo Lee
지도교수의 한글표기 : 권영세
지도교수의 영문표기 : Young-Se Kwon
학위논문 학위논문(석사) - 한국과학기술원 : 전기및전자공학과,
서지주기 참고문헌 수록
주제 화학기상증착
광도파로
RPCVD
$Si_3N_4$
$SiO_2$
MIM capacitor
Optical waveguide
QR CODE qr code