A new aqueous base-developable positive deep UV resist using chemical amplification concepts was prepared by tetrahydropyranylation of vinyl p-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer, which was prepared by acetalization of PVA with p-hydroxybenzaldehyde. Both reaction were performed in DMF solution. Characterizations of the product, Vinyl tetrahydropyranyl ether-vinyl p-tetrahydropyranyloxy benzal-vinyl p-hydroxybenzal-vinyl acetate copolymer(TTBAAc),were performed by using proton-NMR and FT-IR spectrometer. It was possible to obtain the Tg of TTBAAc by using DSC. Thermal and acid-catalyzed deprotections of THP group were studied by using TGA, FT-IR, UV-Vis which were obtained before exposure, after exposure and after PEB. The TTBAAc copolymer had high transparency in the deep UV region. Deep UV lithography processing of the resist containing TTBAAc and triphenylsulfonium hexafluoroantimonate(8 wt%), dissolved in 2-ethoxyethanol, was carried out for image formation. 2-㎛ line/space positive images were obtained.
