서지주요정보
헬리콘파 플라즈마 발생 및 특성 연구 = Study of helicon wave plasma production and its characteristics
서명 / 저자 헬리콘파 플라즈마 발생 및 특성 연구 = Study of helicon wave plasma production and its characteristics / 김정형.
저자명 김정형 ; Kim, Jung-Hyung
발행사항 [대전 : 한국과학기술원, 1996].
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소장정보

등록번호

8006861

소장위치/청구기호

학술문화관(문화관) 보존서고

DPH 96022

SMS전송

도서상태

이용가능

대출가능

반납예정일

초록정보

The characteristics of high density helicon wave plasma generated in a quartz tube of 10 cm in diameter have been studied. The optimum conditions for efficiently exciting helicon wave plasma have been investigated. It is also observed that the plasma fully ionized by helicon waves has the ion pumping effect. Whether the discharge is inductive or capacitive, the plasma potential is important, since it determines the energy of the ion incident on the wall. It is investigated theoretically and experimentally that the fluctuation of the plasma potentials influences the ion energy distribution functions monitored by retarding field energy analyzer. It is also observed that the plasma potential fluctuates with peak-to-peak voltage $V_{p-p}$ in the low density mode. The radio frequency modulation to the plasma potential is weaker in the helicon mode than in the low mode. In most helicon wave experiments, there has been poor agreement between theory and the plasma density radial profiles. The characteristics of the solenoid antenna employed for the excitation of m=1 mode helicon waves in plasma are investigated. A cylindrical high density plasma column with high intensity of ArII emission is observed to be a cylindrical shell shape. In cross-section, the location of the high intensity column nearly coincides with the maximum point of wave power deposition. The radial profiles of the wave magnetic field are in good agreement with computations. These results show excellent agreement between the theory and density profile produced by m=1 helicon wave. The characteristics of plasma produced by m=±1 and m=±2 mode helicon waves have been firstly investigated. Plane polarized m=±1 and m=±2 mode helicon waves are mainly excited using a Nagoya type III antenna and a quadrupole antenna, respectively. Two dimensional cross-field measurements of ArII optical emission induced by hot electrons are made to investigate the RF power deposition. The components of the wave magnetic field measured with a magnetic probe were compared with the field profiles computed for the m=±1 and m=±2 modes. Two and four high intensity plasma columns are observed for the m=±1 and m=±2 modes. These columns are located at the regions between the antenna legs. The radial profiles of the wave magnetic field are in excellent agreement with computations. SiOF films deposited by a helicon wave plasma chemical vapor deposition (CVD) method have been characterized using Fourier transform infrared spectroscopy and ellipsometry. High density plasma of $>10^{12}cm^{-3}$ can be obtained on a substrate at low pressure(<10mTorr) with rf power of >400 using a helicon plasma source with $SiF_4$ and $O_2$ gases. A gas mixture of $SiF_4$, $O_2$, and $Ar$ was used to deposit SiOF films on 5 inch Si(100) wafers not intentionally heated. Optical emission spectroscopy was used to study the relation between the relative densities of the radicals and the deposition mechanism. It was found that the addition of Ar gas to the $SiF_4/O_2$ mixture greatly increased the F concentration in the SiOF film. Discharge conditions such as gas composition, sheath potential, and the relative densities of the radicals affect the properties of the film. The dielectric constant of the SiOF film deposited using the helicon plasma source was 3.1, a value lower than that of the oxide film by other method.

서지기타정보

서지기타정보
청구기호 {DPH 96022
형태사항 ix, 117 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Jung-Hyung Kim
지도교수의 한글표기 : 장홍영
지도교수의 영문표기 : Hong-Young Chang
수록잡지명 : "A Study on Ion Energy Distribution Functions and Plasma Potentials in Helicon Wave Plasmas". Physics of Plasmas. American Institute of Physics, vol. 3, no. 4, pp. 1462-1469 (1996)
수록잡지명 : "The deposition of SiOF film with low dielectric constant in a helicon plasma source". Applied Physics Letters. American Institute of Physics, vol. 68, no. 11, pp. 1507-1509 (1996)
학위논문 학위논문(박사) - 한국과학기술원 : 물리학과,
서지주기 참고문헌 : p. 111-117
주제 헬리콘파
고밀도 플라즈마
SiOF 박막
Helicon waves
High density plasmas
SiOF film
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