서지주요정보
Reactive magnetron sputter ion plating법에 의해 증착된 TiN 박막의 특성에 관한 연구 = A study on characteristics of the TiN thin films deposited by reactive magnetron sputter ion plating
서명 / 저자 Reactive magnetron sputter ion plating법에 의해 증착된 TiN 박막의 특성에 관한 연구 = A study on characteristics of the TiN thin films deposited by reactive magnetron sputter ion plating. / 강희수.
발행사항 [대전 : 한국과학기술원, 1996].
Online Access 원문보기 원문인쇄

소장정보

등록번호

8006495

소장위치/청구기호

학술문화관(문화관) 보존서고

MMS 96003

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반납예정일

리뷰정보

초록정보

TiN films were deposited onto the stellite 6B alloy (Co base) by the reactive magnetron sputter ion plating using the hot cathode triode system introduced to improve the ionization efficiency. As preliminary experiment, the Ⅰ-Ⅴ characteristics of hot cathode triode system was investigated. In this experiments, anode current and substrate current were increased as the function of anode voltage and filament current. The characteristics of deposited TiN film were investigated by various analysis methods. The SEM analysis showed that the morphologies of TiN film were changed from open columnar structure to dense structure with smooth surface. the deposition rate was decreased with increasing substrate bias due to densification and resputtering by the ion bombardment. The major impurity in TiN films was oxygen and the amounts of impurities were decreased greatly when the substrate bias was applied. The mass spectrometer analysis indicated that oxygen was generated from the decomposition of water vapor. The preferred orientation of TiN films were changed from (200) to (111) with decreasing $N_2$/Ar ratio and (200) to (111) and then (220) with increasing substrate bias. The values of micro vickers hardness of TiN films were 2000~3500kgf/㎟ when substrate bias was applied and the hardness was increased with increasing the compressive stress in the films.

서지기타정보

서지기타정보
청구기호 {MMS 96003
형태사항 iv, 73 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Hee-Soo Kang
지도교수의 한글표기 : 이원종
지도교수의 영문표기 : Won-Jong Lee
학위논문 학위논문(석사) - 한국과학기술원 : 재료공학과,
서지주기 참고문헌 : p. 70-73
주제 이온플레이팅
TiN
Ion plating
PVD
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