A new 6 degrees-of-freedom micro stage, based on parallel mechanisms and actuated by using piezoelectric elements, has been developed for the application of micro positioning such as semiconductor manufacturing devices, high precision optical measurement systems, and high accurate machining. The micro stage structure consists of a base platform and an upper platform(stage). The base platform can effectively generates planar motion with yaw motion, while the stage can do vertical motion with roll and pitch motions with respect to the base platform. This separated structure has an advantage of less interference among actuators. The forward and inverse kinematics of the micro stage are discussed. Also, through linearization of kinematic equations about an operating point on the assumption that the configuration of the micro stage remains essentially constant throughout a workspace. To maximize the workspace of the stage relative to a fixed frame, an optimal design procedure of geometric parameters is shown. Hardware description and a prototype are presented. The prototype is about 150mm in height and its base platform is approximately 94mm in diameter. The workspace of the prototype is obtained by computer simulation. Kinematic calibration procedure of the micro stage and its results are presented.
