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Statistical process control for skewed populations = 비대칭 모집단에 대한 통계적 공정관리
서명 / 저자 Statistical process control for skewed populations = 비대칭 모집단에 대한 통계적 공정관리 / In-Su Choi.
발행사항 [대전 : 한국과학기술원, 1996].
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8006411

소장위치/청구기호

학술문화관(문화관) 보존서고

DIE 96011

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9002193

소장위치/청구기호

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DIE 96011 c. 2

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This thesis is concerned with the design of statistical process control methods - $\bar{X}$ and $R$ control charts, variable sampling interval(VSI) $\bar{X}$ control charts, and process capability indices(PCIs)-using the weighted variance(WV) method with no assumptions on the population. This thesis is divided into the following three parts. (ⅰ) A heuristic method based on the WV concept of setting up control limits of $\bar{X}$ and $R$ charts for skewed populations is proposed, and $\bar{X}$ and $R$ charts constants for skewed populations are obtained. This method provides asymmetric control limits in accordance with the direction and degree of skewness estimated from the sample data, by using different variances in computing upper and lower limits. For symmetric populations, however, these control limits are equivalent to those of Shewhart control charts. The new heuristic control charts are compared by Monte Carlo simulation with the Shewhart charts and the geometric control charts of Ferrell when the underlying distribution is Weibull or Burr's. The WV method is also compared with the exact method for the case where the underlying distribution is exponential. (ⅱ) A modification of the WV $\bar{X}$ control charts in which the interval till the next sample varies depending on the current sample mean is considered. The proposed WV VSI $\bar{X}$ charts use long interval length if a sample mean falls between lower and upper threshold limits and short interval length if it falls outside the threshold limits but between the control limits. It provides asymmetric control limits from mean and asymmetric threshold limits from mode in accordance with the shape of the underlying population using different factors in computing upper and lower limits for skewed populations. When the underlying population is symmetric, however, the charts reduce to the standard VSI $\bar{X}$ charts. The performances of the WV VSI $\bar{X}$ charts are compared with the WV $\bar{X}$ charts and the standard VSI $\bar{X}$ charts when the underlying distribution is Weibull or lognormal. (ⅲ) A method of constructing PCIs with no assumptions on the population is presented. This method adjusts the value of the indices according to the degree of skewness estimated from the sample data by considering the standard deviations above and below the process mean separately. For the symmetric populations, however, these indices are equivalent to the standard PCIs. An application example from a semiconductor manufacturing process is given. The asymptotic distributions of the estimators of the PCIs based on the WV method are obtained and performances of the estimators for moderate sample sizes are studied by Monte Carlo simulation.

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서지기타정보
청구기호 {DIE 96011
형태사항 ix, 108 p. : 삽화 ; 26 cm
언어 영어
일반주기 Appendix : A, Proof of theorem 4.1. - B, Proof of lemma 4.2. - C, Proof of theorem 4.3
저자명의 한글표기 : 최인수
지도교수의 영문표기 : Do-Sun Bai
지도교수의 한글표기 : 배도선
학위논문 학위논문(박사) - 한국과학기술원 : 산업공학과,
서지주기 Reference : p. 101-108
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