A new aqueous base-developable positive deep UV resist using chemical amplification concepts was prepared by t-butoxycarbonylation of vinyl p-hydroxybenzal-vinyl alcohol-vinyl acetate copolymer, which had been prepared by acetallization of poly(vinyl alcohol) with p-hydroxybenzaldehyde. Both reactions were performed in DMF solution. Characterizations of the product, vinyl p-tert-butoxycarbonyloxybenzal-vinyl alcohol-vinyl acetate(PTBAAc) copolymer, were performed by using $^1H$-NMR and FT-IR spectrometer. It was possible to assign all peaks in $^1H$-NMR spectra and possible to obtain the Tg of PTBAAc by using DSC. Thermal and acid-catalyzed deprotections of t-BOC group were studued by using TGA, FT-IR, UV_Vis and $^1H$-NMR, which were obtained before exposure, after exposure and after PEB. We could know that the PTBAAc copolymer had high transparency at deep UV region and that it showed bleaching effect during exposure and low weight loss during PEB. Deep UV lithographic processing of the resist containing PTBAAc and diphenyliodonium hexafluoroarsenate(5 wt%), dissolved in DMF, was carried out for image formation. We achived 2-㎛ line/space positive images. The developed patterns exibited incompleteness in contrast. Further study is needed to find the optimum lithographic conditions for this PTBAAc copolymer.
