Wear resistant Titanium Carbonitride (Ti(C,N)) films were deposited on the SKD11, SKH9 tool steels and WC-Co cutting tools by Plasma Enhanced Chemical Vapor Deposition (PECVD) using a gasous mixture of $TiCl_4$, $CH_4$, $N_2$, $H_2$, and Ar.
The effects of deposition variables such as the deposition temperature, parital pressure of reactant gases, and R.F. (Radio Frequency) power on the deposition rate, crystallinity, and chemical composition of the deposited layer were studied.
The experimental results showed that the deposition rate of Ti(C,N) films was much affected by the substrate materials as well as the deposition variables. The crystallographic orientation of Ti(C,N) films deposited by PECVD showed random orientation, and the crystallinity of deposited layer was improved with increasing the deposition temperature and R.F. power and decreasing the $TiCl_4$ inlet fraction.
The Ti(C,N) films deposited by PECVD contained much chlorine and its content was affected by the deposition condition considerably. The chlorine content was decreased at the deposition condition which improved the crystallinity of the deposited layer.
The atomic ratio of N/C in the Ti(C,N) films deposited by PECVD was increased with increasing $N_2/CH_4$ input ratio in the reactant gases.
The deposited Ti(C,N) films had a uniform surface with very fine grains of about 1000Å size and the microhardness of deposited layer was about 2300 ㎏/㎟ and SAT (Scratch Adhesion Test) critical loads were 17-23 N.
