Lithography method for integrated optics using focused laser beam has been developed. The effects of the writing power and/or writing speed on the strip linewidth were investigated. Strip line, X-crossing strip line, and Y-branch patterns have been fabricated on photoresist-coated X-cut LiNbO3 crystal wafer. And optical waveguides are fabricated by Ti indiffusion method. Also, near field patterns and intensity profiles are observed by end fire coupling.