Optical thin film system which contains a totally reflecting boundary is designed for λ=0.633㎛ for use in quarterwave differential phase shift. The chromatic properties of the three designs obtained are investigated in the region of 0.655-0.665㎛ (Δλ/λ =±5%). Throughout the designing process, computer aided optimization technique is used, and an objective function is chosen to be as simple as possible and it is found convenient during the optimization process.
The preparation and testing of a two-layer quarterwave differential phase shift reflector for He-Ne laser wavelength is described. A typical thin film systems designed for 90˚ phase shift prepared by vacuum thermal evaporation is found to give 1.9-2.2% less than 90˚ differential phase shift.
Also, in the present research Rayleigh one-way shutter using the quarterwave differential phase shift thin film system is developed. It is prepared and its efficiency is measured experimentally to be 1500:1.
