PLZT thin films were prepared using sol-gel processing. Such methods have considerable advantages over vacuum deposition particularly for implementation into industrial processing. Among these advantages are easier composition control, easier fabrication of large area thin films and low cost. The crystallization of PLZT thin films was affected by the heating temperature, Pb contents, the heating atmosphere, the coating cycles and the substrate materials. The films mainly consisted of perovskite phase when fired at 600℃ and in $O_2$ and air atmosphere for 2 hours after 7 coating cycles on ITO-coated Corning 7059 glass substrate with 5 mol % excess coating solutions. Perovskite phases had rosettes structure of 2㎛ size and pyrochlore phases had microcrystalline of 100-200$\dot{A}$ size. Cracks were formed because of large volume change during firing for thicker films and because of thermal expansion mismatch between films and substrate during cooling process even for thinner films. The films showed a lower transmittance and smaller interference oscillation as the perovskite phases were formed.
