서지주요정보
MOCVD 법으로 증착된 $Y_1Ba_2Cu_3O_{7-x}$ 박막의 에칭특성에 관한 연구 = A study on etching properties of metal organic chemical vapor deposited $Y_1Ba_2Cu_3O_{7-x}$ thin film
서명 / 저자 MOCVD 법으로 증착된 $Y_1Ba_2Cu_3O_{7-x}$ 박막의 에칭특성에 관한 연구 = A study on etching properties of metal organic chemical vapor deposited $Y_1Ba_2Cu_3O_{7-x}$ thin film / 황두섭.
발행사항 [대전 : 한국과학기술원, 1992].
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등록번호

8002862

소장위치/청구기호

학술문화관(문화관) 보존서고

MMS 92023

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리뷰정보

초록정보

After the discovery of high Tc superconductivity in LaBaCuO by Bednorz and Muller and the subsequent discovery of the superconductivity above liquidnitrogen temperature in YBaCuO system by Wu et al, it became clear that this new material will be important in superconducting electronics. In order to fabricate integrated superconducting devices (e.g.,dc SQUID's) using these materials, the thin films have to be patterned by ㎛ scale. In the case of the thin film made by MOCVD, the superconducting phases were very stable. After the etching process, there was some residual phases which were formed at high deposition temperature. These phases are not superconducting but have high resistivity at liquid nitrogen temperature. The etching rate of the film using strong acid etchant was too high to control the etching process, but phosphoric acid solution is a good candidate because of its lower etching rate. Etching rate was very sensitive to the concentration for the phosphoric acid solution. Because the water in the etchant solution damages the film, etching time must be short. In the case of plasma etching, photoresist could not survive due to high etching rate. Therefore new etching mask have to be developed.

서지기타정보

서지기타정보
청구기호 {MMS 92023
형태사항 [iii], 62 p. : 삽도 ; 26 cm
언어 한국어
일반주기 저자명의 영문표기 : Doo-Sup Hwang
지도교수의 한글표기 : 천성순
지도교수의 영문표기 : Soung-Soon Chun
학위논문 학위논문(석사) - 한국과학기술원 : 전자재료공학과,
서지주기 참고문헌 : p. 61-62
주제 Thin films.
Plasma etching.
에칭. --과학기술용어시소러스
초전도체. --과학기술용어시소러스
박막. --과학기술용어시소러스
MOCVD 법
Metal organic vapor deposition
Critical temperatures
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