Molecular dynamics simulation of nanoindentation and nanolithography by AFM is conducted to study homogeneous nucleation of various defects, and their subsequent development and interactions as well. In nanoindentation, dislocations are found to initiate on the slip plane off the loading axis and to form a loop, and they are finally emitted onto the bottom surface.
During nanolithography via AFM, dislocation loops are emitted along the top surface, and resourceful defect interactions such as, formation of voids chain via the motion of a jog, and creation of extended nodes and stacking fault tetrahedrons are observed. The effects of the scratching depth, speed, and orientation on the resulting defects are discussed as well.
