The mixer masks are fabricated by using the auto focusing of the laser lithography system. The fabricated masks can be aligned within 5um tolerance and it shows that IC fabrication is possible with this lithography system. With these masks the dual - gate mixer is fabricated and conversion loss of the mixer is -20dB. Present lithography system has some problems. We can resolve these problems by modifying the control problem of the stage motor and establishing the conditions of photo resister and develop time. It is supposed that if the beam pass of laser is adjusted more precisely, we can obtain the line width less than 2um.
